Maskless lithography systems

Model: DaLI

Exhibitor: MICROSYS ENGINEERING CO., LTD.

Booth No: TBA

Characteristic

Maskless lithography systems is a general desktop system, suitable for maskless lithography of all standard photoresists. The minimum line width can reach 1um and the 20 times high aspect ratio structure can be realized. Its comprehensive software solution covers all steps from design to exposure and makes DaLI an intuitive solution for maskless lithography. DaLI uses an AOD acousto-optic deflector and a stable laser source to expose the lithographic structure without the need for a photomask. The maskless lithography function makes design changes a breeze because it eliminates the highly sensitive step of aligning the sample with the mask and saves time and money in the process. DaLI is especially suitable for academic units, research units and company R&D units and laboratories.