High temperature rapid heat treatment annealing furnace

Model: NBD-T1100X-RTP

Category: Probe

Booth No: TBA

Characteristic

The rapid annealing furnace, referred to as RTP (Rapid Thermal Processing Furnace), not only has a very fast heating rate, but also moves the sample directly to room temperature after the sintering process is completed to achieve rapid cooling in the physical state. The equipment adopts a gas path structure with an inner tube for air inlet and an outer tube for air outlet, so that the reaction atmosphere and the processed sample are fully and evenly contacted. The annealing furnace is a commonly used equipment for growing large-size two-dimensional graphene by CVD method. The temperature measuring element is in direct contact with the sample to ensure the accuracy of the sample temperature. Mainly used for: 1. Can meet the requirements of rapid annealing after ion implantation; 2. It can also be used for ohmic contact fast alloy; 3. It can also be used for annealing silicide alloys and oxide growth; 4. As well as rapid heat treatment process situations such as selenium deposition in copper indium gallium selenide photovoltaic applications. ◎With over-temperature alarm, over-current protection, and disconnection prompts ◎Passed CE certification. ◎Brand/NOBODY

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High temperature rapid heat treatment annealing furnace

Characteristic

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