Director Imaging Equipment
Model: Ledia Series
Category: Exposure Machine
Exhibitor: SCREEN GP Taiwan Co., Ltd.
Booth No: TBA
Characteristic
手持終端設備上的基板所需要的更高密度、高精細化以及車載電子技術，對於多種多樣的基板的需求，Ledia直接成像設備始終以穩定的曝光技術應對著。透過靈活控制3種波長的光源，能夠更廣域覆蓋曝光時所需之波段，大幅度擴大了適用光阻劑的種類。 光阻劑曝光可用於從MLB到封裝基板、軟板等多種用途，備受好評。另外配備了對基板變形而進行校正的獨家對位演算法，達到與直接成像設備相匹配的高精度和最高水準的產能。凝聚最尖端技術的精粹，作為直接成像設備先驅，不斷引領行業步伐的“Ledia” 請將引入並作為您開發業務，和創造更大利益的最佳合作夥伴。
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