8 inch Maskless Lithography System

Model: PicoMaster XF200

Category:

Exhibitor: MICROSYS ENGINEERING CO., LTD.

Booth No: TBA

Characteristic

PicoMaster XF200 main features: - Parallel multi beam writing strategy - Down to 0.6 μm resolution - Write speed up to 280 mm2/min at 0.6 μm resolution - 256 levels of real-time grayscale lithography - Proprietary autofocus even on challenging substrates - Up to 200 x 200mm exposable area - Stitch-free exposure